Secondary electron generation in electron-beam-irradiated solids:resolution limits to nanolithography

Cheol Eui Lee

J. Korean Phys.Soc. 55,1720 [doi: 10.3938/jkps.55.1720 | PDF Download]

We have investigated the secondary electron generation inelectron-beam-irradiated solids by means of Monte Carlo simulation.The slow secondary electron energy was found to be independent ofthe position and incidence energy of the electron beam, and theelectron beam broadening in thin films by the secondary electronswas found to be at least 5-10 nm, setting limits to thenanolithographic resolution.